12 Month Periodic Activity Report Public Summary
page 3
| Mask repair (NaWoTec) |
CD metrology (Leica) |
Inspection | Pressure sensor (Infineon) |
|
| Spatial resolution | < 5 nm | 2 nm | 10 nm | 1 μm |
| Z-resolution | 1 nm | < 1nm | 5 nm | 10 nm |
| Scan area | 20 x 20 μm | < 2 x 2 μm | 25 x 25 mm - 14 x 14 cm |
100 mm2 - 3000 mm2 |
| Throughput | < 2 min | < 10 sec | < 5 h | < 100 mm2/h |
| Single cantilever | Cantilever array | |||
Table 0.1: Top level specification for the intended pilot applications
According to the workplan SIOS has developed a test bench based on the NMM system.
Fig. 0.3 Test-bench setup comprising nano-measurement machine, probe and cantilever control electronics.
In the next phase of the project an in-situ, vacuum compatible, xy scanning head with integrated cantilever transfer is planned for the mask repair tool at NaWoTec.
In Work package 4 the provision of efficient training, communication tools and dissemination of knowledge are adressed. For this, different activities are organized.